GROWTH-BEHAVIOR OF YBA2CU3O7-DELTA AND NDBA2CU3O7-DELTA THIN-FILMS OBSERVED BY ELECTRON-DIFFRACTION

被引：11

作者：

SHIMIZU, T

NONAKA, H

ARAI, K

机构：

[1] Electrotechnical Laboratory, Tsukuba, Ibaraki 305, 1-1-4, Umezono

来源：

APPLIED PHYSICS LETTERS | 1991年 / 59卷 / 05期

关键词：

D O I：

10.1063/1.105398

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Growth behavior of thin films of YBa2CU3O7-delta and NdBa2CU3O7-delta has been observed in reflection high-energy electron diffraction (RHEED) during coevaporation of constituent metal atoms with a NO2 supersonic molecular beam. The intensity oscillations of RHEED specular beam have been observed during deposition. The nucleation behavior of NdBa2CU3O7-delta is found to be different from that of YBa2CU3O7-delta in RHEED observation.

引用

页码：600 / 602

页数：3

共 12 条

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