TEXTURE ANALYSIS OF AL/SIO2 FILMS DEPOSITED BY A PARTIALLY IONIZED BEAM

被引:24
作者
KNORR, DB [1 ]
LU, TM [1 ]
机构
[1] RENSSELAER POLYTECH INST,CTR INTEGRATED ELECTR,DEPT PHYS,TROY,NY 12180
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D O I
10.1063/1.101126
中图分类号
O59 [应用物理学];
学科分类号
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页码:2210 / 2212
页数:3
相关论文
共 16 条
[1]  
BUNGE HJ, 1982, QUANTITATIVE TEXTURE, P85
[2]   ANALYSIS OF CERTAIN ERRORS IN THE X-RAY REFLECTION METHOD FOR THE QUANTITATIVE DETERMINATION OF PREFERRED ORIENTATIONS [J].
CHERNOCK, WP ;
BECK, PA .
JOURNAL OF APPLIED PHYSICS, 1952, 23 (03) :341-345
[3]   EPITAXIAL-GROWTH OF AL(111) SI(111) FILMS USING PARTIALLY IONIZED BEAM DEPOSITION [J].
CHOI, CH ;
HARPER, RA ;
YAPSIR, AS ;
LU, TM .
APPLIED PHYSICS LETTERS, 1987, 51 (24) :1992-1994
[4]  
Cullity B.D., 1978, ELEMENTS XRAY DIFFRA
[5]  
Fraser D. B., 1983, VLSI technology, P347
[6]  
GHATE PB, 1983, SOLID STATE TECH MAR, P113
[7]  
Li P. T. X, UNPUB
[8]   A HIGH IONIZATION EFFICIENCY SOURCE FOR PARTIALLY IONIZED BEAM DEPOSITION [J].
MEI, SN ;
LU, TM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (01) :9-12
[9]  
PRAMANIK D, 1983, SOLID STATE TECHNO 2, P131