DETERMINATION OF IMPLANTATION PROFILES IN SOLIDS BY SECONDARY ION MASS-SPECTROMETRY

被引：18

作者：

MAUL, J

WITTMAACK, K

SCHULZ, F

机构：

来源：

关键词：

D O I：

10.1016/0375-9601(72)91101-2

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：177 / +

页数：1

共 11 条

[1]

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[2]

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[4]

GAMO K, 1971, 2 P INT C ION IMPL S, P459

[5]

MAUL J, 1972, P37 GSF BER

[6]

Nelson R. S., 1970, Radiation Effects, V6, P131, DOI 10.1080/00337577008235055

[7]

PISTRYAK VM, 1970, SOV PHYS-SOLID STATE, V12, P1005

[8]

RUGE I, 1971, 2 P INT C ION IMPL S

[9]

SEIDEL TE, 1971, 2 P INT C ION IMPL S, P47

[10] ANALYSIS OF SURFACES UTILIZING SPUTTER ION SOURCE INSTRUMENTS [J].

SOCHA, AJ .