ANALYSIS OF SURFACES UTILIZING SPUTTER ION SOURCE INSTRUMENTS

[1] ANDERSEN CA, 1969, 4 NATL C MICR SOC AM

[2] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[3] ARDENNES MV, 1956, TABELLEN ELEKTRONENP, V1, P544

[4] BARRINGTON AE, 1966, PROG NUCL ENERGY 9, V7, P243

[5] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8

[6] Castaing R., 1951, THESIS U PARIS

[7] Castaing R., 1962, J MICROSCOPIE, V1, P395

[8] ION SOURCE FOR MASS SPECTROGRAPHY [J]. PHYSICAL REVIEW, 1949, 76 (06): : 855 - 856

[9] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) : 549 - 555

[10] ION MICROPROBE MASS ANALYZER [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) : 5277 - &

[1] ANDERSEN CA, 1969, 4 NATL C MICR SOC AM

[2] ANDERSEN CA, 1969, INT J MASS SPECTROM, V2, P61

[3] ARDENNES MV, 1956, TABELLEN ELEKTRONENP, V1, P544

[4] BARRINGTON AE, 1966, PROG NUCL ENERGY 9, V7, P243

[5] SECONDARY POSITIVE ION EMISSION FROM METAL SURFACES [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (01) : 1 - 8

[6] Castaing R., 1951, THESIS U PARIS

[7] Castaing R., 1962, J MICROSCOPIE, V1, P395

[8] ION SOURCE FOR MASS SPECTROGRAPHY [J]. PHYSICAL REVIEW, 1949, 76 (06): : 855 - 856

[9] SPUTTERING OF SURFACES BY POSITIVE ION BEAMS OF LOW ENERGY [J]. JOURNAL OF APPLIED PHYSICS, 1958, 29 (03) : 549 - 555

[10] ION MICROPROBE MASS ANALYZER [J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) : 5277 - &