ABLATION DYNAMICS OF SILICON-BASED TARGETS IN OXYGEN AND NITROGEN ATMOSPHERES

被引：30

作者：

MARINE, W

TOKAREV, V

GERRI, M

SENTIS, M

FOGARASSY, E

机构：

[1] FAC SCI LUMINY,IMFM,CNRS,UM 34,F-13288 MARSEILLE 9,FRANCE

[2] CRN,LAB PHASE,CNRS,UPR 292,F-67037 STRASBOURG 02,FRANCE

来源：

THIN SOLID FILMS | 1994年 / 241卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(94)90407-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The optical emission from plasma produced by excimer laser (ArF, lambda = 193 nm) ablation of Si, SiO and Si3N4 targets was studied in the visible range. We present results of the time integrated optical spectroscopy measurements and time-of-flight analysis of the particle expansion dynamics. Both methods show the formation of diatomic molecules within the laser induced plasma plume. The velocities of the ejected species are strongly affected by a chemical reaction inside the plasma plume.

引用

页码：103 / 108

页数：6

共 16 条

[1] PHOTOELECTRIC EFFECT UNDER STRONG IRRADIATION [J].