ADSORPTION AND PHOTOREACTIONS OF NO ON NB(110) AT 20-K

被引：24

作者：

BARTKE, TU

FRANCHY, R

IBACH, H

机构：

[1] Institut für Grenzflächenforschung und Vakuumphysik, KFA-Forschungszentrum Jülich, D-5070 Jülich

来源：

SURFACE SCIENCE | 1992年 / 272卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(92)91454-J

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The adsorption and photon induced reactions in the wavelength region 240-610 nm of NO adsorbed on Nb(110) at 20 K has been studied by means of HREELS (DELTA-E1/2 less-than-or-equal-to 4 meV). The photoexperiments have been performed by using a Hg arc lamp in combination with various colour glass filters. At low exposure (less-than-or-equal-to 2 L) NO is adsorbed in part dissociatively and in part molecularly in several adsorption states. At higher exposure NO is also physisorbed. In addition the formation and adsorption of the ON-NO dimer has been observed. Simultaneously N2O is formed and adsorbed in small amount. No photon induced reactions have been observed above lambda > 375 nm. Below lambda < 340 nm the following photon stimulated phenomena have been found: (1) The (NO)2 dimer and the physisorbed NO molecules are desorbed from the surface. (2) NO and (NO)2 are photodissociated and atomic oxygen is adsorbed on the surface, simultaneously N2O is formed and adsorbed on the surface.

引用

页码：299 / 305

页数：7

共 28 条

[11] INFRARED SPECTRUM OF MATRIX-ISOLATED (NO)2 [J].