INFRARED PROPERTIES OF SILICON MONOX AND EVAPORATED SIO FILMS

被引：13

作者：

HOWARTH, LE

SPITZER, WG

机构：

来源：

JOURNAL OF THE AMERICAN CERAMIC SOCIETY | 1961年 / 44卷 / 01期

关键词：

D O I：

10.1111/j.1151-2916.1961.tb15342.x

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

收藏

页码：26 / 28

页数：3

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