ELECTROLYTIC DEPOSITION OF THIN METAL-FILMS ON SEMICONDUCTOR SUBSTRATES

被引：81

作者：

BINDRA, P ^{[1
]}

GERISCHER, H ^{[1
]}

KOLB, DM ^{[1
]}

机构：

[1] MAX PLANCK GESELL,FRITZ HABER INST,D-1000 BERLIN 33,FED REP GER

来源：

关键词：

D O I：

10.1149/1.2133471

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1012 / 1018

页数：7

共 21 条

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