X-RAY-REFLECTIVITY STUDY OF THE GROWTH-KINETICS OF VAPOR-DEPOSITED SILVER FILMS

被引：119

作者：

THOMPSON, C

PALASANTZAS, G

FENG, YP

SINHA, SK

KRIM, J

机构：

[1] NORTHEASTERN UNIV,DEPT PHYS,BOSTON,MA 02115

[2] EXXON RES & ENGN CO,CORP RES LABS,ANNANDALE,NJ 08801

来源：

PHYSICAL REVIEW B | 1994年 / 49卷 / 07期

关键词：

D O I：

10.1103/PhysRevB.49.4902

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

X-ray-reflectivity measurements have been carried out on silver films which were vapor deposited onto silicon substrates, to investigate the thickness evolution of the film's surface roughness. The growth exponent was found to be beta = 0.26+/-0.05, and the roughness exponenet was found to be H = 0. 70+/-0.10.

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收藏

页码：4902 / 4907

页数：6

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