ELECTRONIC DENSITY OF STATES IN CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICON

被引:5
作者
NAKASHITA, T
HIROSE, M
OSAKA, Y
机构
[1] Department of Electrical Engineering, Faculty of Engineering, Hiroshima University
关键词
D O I
10.1143/JJAP.18.405
中图分类号
O59 [应用物理学];
学科分类号
摘要
[No abstract available]
引用
收藏
页码:405 / 406
页数:2
相关论文
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