GROWTH AND STRUCTURE OF FCC (100) CO/CU AND FE/CU MULTILAYERS

被引:4
作者
GIRON, F [1 ]
BOHER, P [1 ]
HOUDY, P [1 ]
BEAUVILLAIN, P [1 ]
LEDANG, K [1 ]
VEILLET, P [1 ]
机构
[1] UNIV PARIS 11,INST ELECTR FONDAMENTALE,CNRS,URA 022,F-91405 ORSAY,FRANCE
关键词
D O I
10.1016/0304-8853(93)91140-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High quality Co/Cu and Fe/Cu multilayers have been deposited on (100) Cu/Si substrates using the diode-rf sputtering technique. A special preparation leads to a well-defined pseudo-epitaxial Co/Cu fcc (100) structure, as observed in situ on the RHEED patterns and ex situ by X-ray diffraction. Using nuclear magnetic resonance, we show that the (100) Co planes are also strongly textured on the microscopic scale. For the Fe/Cu multilayers the fcc (100) structure is metastable, and appears only if the Fe layer thickness is smaller than the Cu one. Otherwise the bcc (110) Fe/fcc (111) Cu structure is only detected without crystalline order in the plane of the films.
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页码:24 / 29
页数:6
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