RF DISCHARGE PLASMA CONDITIONS IN A PLASMA PROCESSING APPARATUS

被引：5

作者：

OJHA, SM ^{[1
]}

机构：

[1] UNIV SUSSEX,EAPS,PLASMA MAT PROCESSING,BRIGHTON,SUSSEX,ENGLAND

来源：

关键词：

D O I：

10.1016/S0042-207X(77)80765-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：65 / 67

页数：3

共 7 条

[1]

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[2]

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HAY, MG ;

MARTIN, JW .

JOURNAL OF THE LESS-COMMON METALS, 1969, 18 (01) :27-&

[4] CHEMICAL SPUTTERING OF GRAPHITE IN AN OXYGEN PLASMA [J].

HOLLAND, L ;

OJHA, SM .

JOHNSON, EO ;

MALTER, L .

PHYSICAL REVIEW, 1950, 80 (01) :58-68

[6]

LEE SM, 1971, INSUL CIRCUITS, P33

[7]

MICHELETTI B, 1971, SOLID STATE TECH APR, P27