ATOMIC LAYER GROWTH OF BI-SR-CA-CU-O BY MOLECULAR-BEAM EPITAXY USING OZONE UNDER UV IRRADIATION

被引:11
作者
YOKOYAMA, S [1 ]
ISHIBASHI, T [1 ]
YAMAGAMI, M [1 ]
KAWABE, M [1 ]
机构
[1] UNIV TSUKUBA,INST MAT SCI,SAKURA,IBARAKI 305,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1991年 / 30卷 / 1B期
关键词
OXIDE SUPERCONDUCTOR; BI-SR-CA-CU-O; MOLECULAR BEAM EPITAXY; OZONE; ULTRAVIOLET LIGHT; LAYER-BY-LAYER GROWTH; RECONSTRUCTION;
D O I
10.1143/JJAP.30.L106
中图分类号
O59 [应用物理学];
学科分类号
摘要
Bi-Sr-Ca-Cu-O thin film with a zero-resistance critical temperature of 58 K has been grown by the molecular beam epitaxy technique in an ozone and oxygen mixture ambient under irradiation of ultraviolet light without postheat treatment. In situ reflection high-energy electron diffraction measurement during the layer-by-layer growth reveals that the reconstruction takes place just after completing the deposition of a single unit layer (a half-unit cell).
引用
收藏
页码:L106 / L109
页数:4
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