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APPLICATION OF PIXE TO THE MEASUREMENT OF SPUTTER DEPOSITS

被引：5
作者：
KRUGER, W
SCHARMANN, A
AFRIDI, H
BRAUER, G
机构：
来源：
NUCLEAR INSTRUMENTS & METHODS | 1980年 / 168卷 / 1-3期
关键词：
D O I：
10.1016/0029-554X(80)91285-9
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
收藏
页码：411 / 414
页数：4
相关论文
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[3]  
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[4]  
LITTMARK U, 1979, J PHYS D, V8, P241
[5]   ANGULAR-DISTRIBUTION MEASUREMENTS OF SPUTTERED ATOMS WITH CHARACTERISTIC X-RAY-EMISSION [J].
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SCHARMANN, A .
NUCLEAR INSTRUMENTS & METHODS, 1976, 132 (JAN-F) :355-362
[6]   ANGULAR-DISTRIBUTIONS OF ATOMS SPUTTERED FROM POLYCRYSTALLINE FCC-METALS AND BCC-METALS [J].
RODELSPERGER, K ;
SCHARMANN, A .
ZEITSCHRIFT FUR PHYSIK B-CONDENSED MATTER, 1977, 28 (01) :37-42
[7]   THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J].
SIGMUND, P .
PHYSICAL REVIEW, 1969, 184 (02) :383-+
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