XPS STUDY OF CHEMICALLY ETCHED GAAS AND INP

被引:164
作者
BERTRAND, PA
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 01期
关键词
D O I
10.1116/1.570694
中图分类号
O59 [应用物理学];
学科分类号
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页码:28 / 33
页数:6
相关论文
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