NOVEL SUPERRESOLUTION TECHNIQUE FOR OPTICAL LITHOGRAPHY - NONLINEAR MULTIPLE EXPOSURE METHOD

被引：20

作者：

OOKI, H

KOMATSU, M

SHIBUYA, M

机构：

[1] Optical Division, Nikon Corporation, Shinagawa-ku, Tokyo, 140

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1994年 / 33卷 / 2A期

关键词：

OPTICAL LITHOGRAPHY; RESIST; NONLINEAR PHOTOSENSITIVITY; 2-PHOTON ABSORPTION; MULTIPLE EXPOSURE; CUTOFF FREQUENCY;

D O I：

10.1143/JJAP.33.L177

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A novel method for optical lithography using a resist with nonlinear photosensitivity and the multiple exposure technique is described. By means of this method, the diffraction-limited optical cutoff frequency is raised markedly, which cannot be realized by any of the other methods proposed previously. A brief explanation of the principle is given and computer simulations are demonstrated.

引用

页码：L177 / L179

页数：3

共 6 条

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DILL, FH
HORNBERGER, WP
HAUGE, PS
SHAW, JM
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 445 - 452
[2] KOMATSU M, 1993, P SOC PHOTO-OPT INS, V1927, P413, DOI 10.1117/12.150440
[3] LEVENSON MD, 1982, IEEE T ELECTRON DEV, V29, P1826
[4] Shibuya M., 1982, Japan Patent, Patent No. 62052
[5] SHIRAISHI N, 1992, P SOC PHOTO-OPT INS, V1674, P741, DOI 10.1117/12.130364
[6] WU ES, 1992, P SOC PHOTO-OPT INS, V1674, P776, DOI 10.1117/12.130367

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