WAVELENGTH CONSIDERATIONS IN SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：25

作者：

HAWRYLUK, AM

CEGLIO, NM

机构：

[1] Lawrence Livermore National Laboratory, Livermore, CA, 94551, P.O. Box 5508

来源：

APPLIED OPTICS | 1993年 / 32卷 / 34期

关键词：

Constraint theory - Focusing - Imaging techniques - Light sources - Mirrors - Optical design - Optical multilayers - Optical resolving power - Parameter estimation - Photoresists - Systems analysis;

D O I：

10.1364/AO.32.007062

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The choice of the operational wavelength for a soft-x-ray projection lithography system affects a wide variety of system parameters such as optical design, sources, resists, and multilayer mirrors. Several system constraints limit the choice for the operational wavelength. In particular, optical imaging requirements place an upper limit and throughput issues place a lower limit on the wavelength selection. We have determined that there are several discrete wavelength regions between 10 and 25 nm that satisfy the system-imposed constraints of high resolution, large depth of focus, and high throughput.

引用

页码：7062 / 7067

页数：6

共 15 条

[1] HIGH-ENERGY LITHOGRAPHY ILLUMINATION BY OXFORDS SYNCHROTRON - A COMPACT SUPERCONDUCTING SYNCHROTRON X-RAY SOURCE [J].

ANDREWS, DE ;

WILSON, MN .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1696-1701

[2]

CEGLIO NM, 1991, MULTILAYER OPTICS AD, V1547, P82

[3]

HAWRYLUK AM, IN PRESS J XRAY SCI

[4]

HOFER D, 1992, COMMUNICATION

[5]

KAUFFMAN RL, 1992, OSA TECHNICAL DIGEST, V8, P17

[6]

KEARNEY PA, 1991, P SOC PHOTO-OPT INS, V1547, P63

[7]

KINOSHITA H, 1991, OSA PROC, V12, P11

[8]

MARKLE D, 1991, COMMUNICATION

[9]

NEWNAM B, 1990, P SOC PHOTOOPT INSTR, V1343, P214

[10]

NEWNAM BE, 1990, P SOC PHOTO-OPT INS, V1227, P116, DOI 10.1117/12.18611

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