VACUUM-ARC ION SOURCES

被引:391
作者
BROWN, IG
机构
关键词
D O I
10.1063/1.1144756
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The vacuum arc is a rich source of highly ionized metal plasma that can be used to make a high current metal ion source. Vacuum arc ion sources have been developed for a range of applications including ion implantation for materials surface modification, particle accelerator injection for fundamental nuclear physics research, and other fundamental and applied purposes. The beam parameters can be attractive, and the source has provided a valuable addition to the spectrum of ion sources available to the experimenter. Beams have been produced from over 50 of the solid metals of the periodic table, with mean ion energy up to several hundred keV and with beam current up to several amperes. Typically the source is repetitively pulsed with pulse length of order a millisecond and duty cycle of order 1%, and operation of a dc embodiment has been demonstrated. Here the source fundamentals and operation are reviewed, the source and beam characteristics summarized, and some applications examined.
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页码:3061 / 3082
页数:22
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