REPETITIVELY PULSED METAL-ION BEAMS FOR ION-IMPLANTATION

[1] ADLER RJ, UNPUB HIGH CURRENT I

[2] BRICE DK, SAND750622 SAND NAT

[3] Ion sources for mass spectroscopy [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1936, 7 (01) : 46 - 49

[4] Glasoe G.N., 1948, PULSE GENERATORS

[5] HIRVONEN JK, 1900, TREATISE MATERIALS S, V18

[6] ION-BEAM ANNEALING OF SEMICONDUCTORS [J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 187 - 189

[7] INTENSE PULSED ION-BEAMS FOR FUSION APPLICATIONS [J]. NUCLEAR FUSION, 1980, 20 (12) : 1549 - 1612

[8] VACUUM ARC ION CURRENTS AND ELECTRODE PHENOMENA [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (04): : 546 - +

[9] RECENT ADVANCES IN THE FIELD OF ION-INDUCED KINETIC ELECTRON-EMISSION FROM SOLIDS [J]. VACUUM, 1983, 33 (09) : 555 - 563

[10] MICROSECOND-PULSE INSULATION AND INTENSE ION-BEAM GENERATION IN A MAGNETICALLY INSULATED VACUUM DIODE [J]. APPLIED PHYSICS LETTERS, 1977, 30 (04) : 182 - 185

[1] ADLER RJ, UNPUB HIGH CURRENT I

[2] BRICE DK, SAND750622 SAND NAT

[3] Ion sources for mass spectroscopy [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1936, 7 (01) : 46 - 49

[4] Glasoe G.N., 1948, PULSE GENERATORS

[5] HIRVONEN JK, 1900, TREATISE MATERIALS S, V18

[6] ION-BEAM ANNEALING OF SEMICONDUCTORS [J]. APPLIED PHYSICS LETTERS, 1980, 37 (02) : 187 - 189

[7] INTENSE PULSED ION-BEAMS FOR FUSION APPLICATIONS [J]. NUCLEAR FUSION, 1980, 20 (12) : 1549 - 1612

[8] VACUUM ARC ION CURRENTS AND ELECTRODE PHENOMENA [J]. PROCEEDINGS OF THE INSTITUTE OF ELECTRICAL AND ELECTRONICS ENGINEERS, 1971, 59 (04): : 546 - +

[9] RECENT ADVANCES IN THE FIELD OF ION-INDUCED KINETIC ELECTRON-EMISSION FROM SOLIDS [J]. VACUUM, 1983, 33 (09) : 555 - 563

[10] MICROSECOND-PULSE INSULATION AND INTENSE ION-BEAM GENERATION IN A MAGNETICALLY INSULATED VACUUM DIODE [J]. APPLIED PHYSICS LETTERS, 1977, 30 (04) : 182 - 185