PREPARATION AND PROPERTIES OF A-SIGE-H FILMS FABRICATED WITH A SUPER CHAMBER (SEPARATED ULTRAHIGH-VACUUM REACTION CHAMBER)

被引：7

作者：

HAKU, H

SAYAMA, K

NAKASHIMA, Y

TAKAHAMA, T

ISOMURA, M

TARUI, H

HISHIKAWA, Y

TSUDA, S

NAKANO, S

OHNISHI, M

KUWANO, Y

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1987年 / 26卷 / 12期

关键词：

D O I：

10.1143/JJAP.26.1978

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1978 / 1982

页数：5

共 7 条

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[2] HYDROGEN EVOLUTION FROM A-SI-C-H AND A-SI-GE-H ALLOYS [J].

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[3] GUIDING PRINCIPLE IN THE PREPARATION OF HIGH-PHOTOSENSITIVE HYDROGENATED AMORPHOUS SI-GE ALLOYS FROM GLOW-DISCHARGE PLASMA [J].

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[4]

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Nakano S., 1986, MAT RES SOC P, V70, P511, DOI [10.1557/PROC-70-511, DOI 10.1557/PROC-70-511]

[6]

ODA S, 1984, INT PHOTOVOLTAIC SCI, V1, P429

[7] PREPARATION AND PROPERTIES OF HIGH-QUALITY A-SI FILMS WITH A SUPER CHAMBER (SEPARATED ULTRAHIGH-VACUUM REACTION CHAMBER) [J].

TSUDA, S ;

TAKAHAMA, T ;

ISOMURA, M ;

TARUI, H ;

NAKASHIMA, Y ;

HISHIKAWA, Y ;

NAKAMURA, N ;

MATSUOKA, T ;

NISHIWAKI, H ;

NAKANO, S ;

OHNISHI, M ;

KUWANO, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1987, 26 (01) :33-38

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