The crystalline structures of sputtered and evaporated metallic films.

被引：22

作者：

Kahler, H ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY USA

来源：

PHYSICAL REVIEW | 1921年 / 18卷 / 03期

关键词：

D O I：

10.1103/PhysRev.18.210

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：210 / 217

页数：8

共 24 条

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