EFFECT OF DC ELECTRIC-FIELD ON THE BASIC PROPERTIES OF RF PLASMA DEPOSITED A-SI

被引:29
作者
OKAMOTO, H
YAMAGUCHI, T
NITTA, Y
HAMAKAWA, Y
机构
关键词
D O I
10.1016/0022-3093(80)90594-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:201 / 206
页数:6
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