RF SPUTTERING

被引：54

作者：

JACKSON, GN

机构：

来源：

关键词：

D O I：

10.1016/0040-6090(70)90095-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：209 / &

共 67 条

[1] SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS
ANDERSON, GS
MAYER, WN
WEHNER, GK
[J]. JOURNAL OF APPLIED PHYSICS, 1962, 33 (10) : 2991 - &
[2] SOME EXPERIMENTAL RESULTS FROM A NONEQUILIBRIUM RF DISCHARGE
BOEDEKER, LR
HALDEMAN, CW
[J]. AIAA JOURNAL, 1968, 6 (03) : 538 - &
[3] SUBSTRATE BOMBARDMENT DURING RF SPUTTERING
BRODIE, I
LAMONT, LT
MYERS, DO
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1969, 6 (01): : 124 - &
[4] LIMITS FOR THE DIFFUSION THEORY OF HIGH FREQUENCY GAS DISCHARGE BREAKDOWN
BROWN, SC
MACDONALD, AD
[J]. PHYSICAL REVIEW, 1949, 76 (11): : 1629 - 1633
[5] PLASMA SHEATH FORMATION BY RADIO-FREQUENCY FIELDS
BUTLER, HS
KINO, GS
[J]. PHYSICS OF FLUIDS, 1963, 6 (09) : 1346 - 1355
[6] CARPENTER RB, 1967, THESIS BRIGHTON COLL
[7] CARTER G, 1968, ION BOMBARDMENT SOLI, P40
[8] CHENOT M, 1947, THESIS FS PARIS
[9] DIELECTRIC THIN FILMS THROUGH RF SPUTTERING
DAVIDSE, PD
MAISSEL, LI
[J]. JOURNAL OF APPLIED PHYSICS, 1966, 37 (02) : 574 - &
[10] DAVIDSE PD, 1965, 3RD P INT C VAC TECH, P651