SPUTTERING OF DIELECTRICS BY HIGH-FREQUENCY FIELDS

被引：133

作者：

ANDERSON, GS

MAYER, WN

WEHNER, GK

机构：

来源：

关键词：

D O I：

10.1063/1.1728549

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2991 / &

共 9 条

[1] ATOM EJECTION PATTERNS IN SINGLE-CRYSTAL SPUTTERING [J].

ANDERSON, GS ;

WEHNER, GK .

ANDERSON, GS .

[3]

BUTLER HS, AF49638415 CONTR

HINES, RL ;

ARNDT, R .

PHYSICAL REVIEW, 1960, 119 (02) :623-633

[5]

HOLLAND L, 1956, VACUUM DEPOSITION TH

[6] PRODUCTION AND ANALYSIS OF A LARGE-DIAMETER PLASMA BEAM [J].

MECKEL, BB ;

HARKINS, PA .

[7]

SPIVAK GV, 1957, DOKL AKAD NAUK SSSR+, V114, P1001

[8] SPUTTERING YIELDS AT VERY LOW BOMBARDING ION ENERGIES [J].

STUART, RV ;

WEHNER, GK .

[9] SPUTTERING THRESHOLDS AND DISPLACEMENT ENERGIES [J].

STUART, RV ;

WEHNER, GK .