ANNEALING OF THIN MAGNETORESISTIVE PERMALLOY-FILMS

被引：19

作者：

KRONGELB, S

GANGULEE, A

DAS, G

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

[2] IBM CORP,SYST PROD DIV,E FISHKILL,NY 12533

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1973年 / MAG9卷 / 03期

关键词：

D O I：

10.1109/TMAG.1973.1067608

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：568 / 570

页数：3

共 14 条

[1]

Anderson R. L., 1973, Journal of Electronic Materials, V2, P161, DOI 10.1007/BF02666150

[2] MEASUREMENTS OF SELF-DIFFUSION COEFFICIENTS IN COPPER FROM ANNEALING OF VOIDS [J].

BOWDEN, HG ;

BALLUFFI, RW .

PHILOSOPHICAL MAGAZINE, 1969, 19 (161) :1001-&

[3] MECHANISMS OF STRESS RELIEF IN POLYCRYSTALLINE FILMS [J].

CHAUDHARI, P .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1969, 13 (02) :197-+

[4] SELF-DIFFUSION OF NI IN NI-FE ALLOYS [J].

DERECA, EW ;

PAMPILLO, C .

ACTA METALLURGICA, 1967, 15 (08) :1263-&

[5] STRUCTURE OF ELECTROPLATED AND VAPOR-DEPOSITED COPPER FILMS .2. EFFECTS OF ANNEALING [J].

GANGULEE, A .

JOURNAL OF APPLIED PHYSICS, 1972, 43 (10) :3943-&

[6] MIGRATION OF SMALL ANGLE BOUNDARIES [J].

GLEITER, H .

PHILOSOPHICAL MAGAZINE, 1969, 20 (166) :821-&

[7]

GORDON P, 1966, RECRYSTALLIZATION GR

[8]

HOFFMANN H, 1965, Z ANGEW PHYSIK, V18, P499

[9]

HOROWITZ SJ, 1970, THESIS RICE U

[10]

Krongelb S., 1973, Journal of Electronic Materials, V2, P227, DOI 10.1007/BF02666155

← 1 2 →