STRUCTURE OF ELECTROPLATED AND VAPOR-DEPOSITED COPPER FILMS .2. EFFECTS OF ANNEALING

被引：26

作者：

GANGULEE, A

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1972年 / 43卷 / 10期

关键词：

D O I：

10.1063/1.1660853

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3943 / &

共 26 条

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