RESISTIVITY AND MICROSTRUCTURE OF POLYCRYSTALLINE AU FILMS DEPOSITED BY RF BIAS-DIODE AND TRIODE SPUTTERING

被引：12

作者：

CORNELY, RH

ALI, TA

机构：

来源：

关键词：

D O I：

10.1063/1.325370

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4094 / 4097

页数：4

共 15 条

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[3] VARIATIONS AVEC LA TEMPERATURE DE LA RESISTIVITE DES COUCHES MINCES DOR
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VAN, VN
[J]. SURFACE SCIENCE, 1967, 6 (01) : 98 - &
[4] CAMPBELL DS, 1966, USE THIN FILMS PHYSI, P315
[5] NUCLEATION AND GROWTH OF RF TRIODE-SPUTTERED GOLD-FILMS
CORNELY, RH
MUMTAZ, A
FUSCHILLO, N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (03): : 693 - 696
[6] ELECTRICAL AND OPTICAL-PROPERTIES OF RF TRIODE-SPUTTERED AU FILMS
CORNELY, RH
FUSCHILL.N
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 163 - 166
[7] CORNELY RH, 1974, 6TH P INT VAC C KYOT, P681
[8] CORNELY RH, 1974, JPN J APPL PHYS S, V2, P681
[9] HOLLAND L, 1965, THIN FILM MICROELECT
[10] LARSEN DC, 1971, PHYSICS THIN FILMS, V6