NUCLEATION AND GROWTH OF RF TRIODE-SPUTTERED GOLD-FILMS

被引：12

作者：

CORNELY, RH

MUMTAZ, A

FUSCHILLO, N

机构：

[1] NEWARK COLL ENGN,ELECTR ENGN DEPT,NEWARK,NJ 07102

[2] RUTGERS STATE UNIV,ELECTR ENGN DEPT,NEW BRUNSWICK,NJ 08903

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1975年 / 12卷 / 03期

关键词：

D O I：

10.1116/1.568648

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：693 / 696

页数：4

共 11 条

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[3] CONDENSATION OF HIGH-ENERGY ATOMIC BEAMS
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[4] INFLUENCE OF ELECTRIC FIELD ON GROWTH OF THIN METAL FILMS
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[5] ELECTRICAL AND OPTICAL-PROPERTIES OF RF TRIODE-SPUTTERED AU FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1974, 11 (01): : 163 - 166
[6] CORNELY RH, 1975, 6TH P INT VAC C
[7] NUCLEATION AND INITIAL-GROWTH BEHAVIOR OF THIN-FILM DEPOSITS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1967, 4 (05): : 209 - &
[8] MITCHELL IV, 1971, VACUUM, V21, P591
[9] Sherman D. M., 1973, Journal of Vacuum Science and Technology, V10, P155, DOI 10.1116/1.1317928
[10] ENERGY SPECTRUM OF EJECTED ATOMS DURING HIGH ENERGY SPUTTERING OF GOLD
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