ANALYTICAL SYSTEM FOR SECONDARY ION MASS-SPECTROMETRY IN ULTRA HIGH-VACUUM

被引：20

作者：

HUBER, WK

SELHOFER, H

BENNINGH.A

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1972年 / 9卷 / 01期

关键词：

D O I：

10.1116/1.1316662

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：482 / &

共 10 条

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[3] UNTERSUCHUNGEN ZUR EMISSION POSITIVER SEKUNDARIONEN AUS FESTEN TARGETS . DIE BRAUCHBARKEIT DER IONENBESCHUSS-IONENQUELLE IN DER MASSENSPEKTROSKOPIE [J].

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[4]

CASTAING R, 1962, CR HEBD ACAD SCI, V255, P1893

[5] ION SOURCE FOR MASS SPECTROGRAPHY [J].

HERZOG, RFK ;

VIEHBOCK, FP .

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[6] ELECTRON-INDUCED ION DESORPTION FROM SYSTEM PLATINUM/HYDROGEN/CARBON MONOXIDE [J].

HUBER, WK ;

RETTINGH.G .

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[7] ION MICROPROBE MASS ANALYZER [J].

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JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) :5277-&

[8] SPUTTERING ION SOURCE FOR SOLIDS [J].

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[9]

ROBINSON CF, 1968, 3 NAT C EL MICR AN C

[10]

WERNER H, 1969, DEVELOPMENTS APPL A, V1, P239

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