ELECTRON-ENERGY DISTRIBUTIONS IN OXYGEN MICROWAVE PLASMAS

被引:28
作者
HEIDENREICH, JE [1 ]
PARASZCZAK, JR [1 ]
MOISAN, M [1 ]
SAUVE, G [1 ]
机构
[1] UNIV MONTREAL,DEPT PHYS,MONTREAL H3C 3J7,QUEBEC,CANADA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期
关键词
D O I
10.1116/1.583980
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:288 / 292
页数:5
相关论文
共 17 条
  • [1] ELECTRON ENERGY DISTRIBUTIONS IN PLASMAS .1.
    BOYD, RLF
    TWIDDY, ND
    [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1959, 250 (1260): : 53 - 69
  • [2] Chapman B., 1980, GLOW DISCHARGE PROCE, P64
  • [3] Chen F., 1965, ELECT PROBES PLASMA, P113
  • [4] PLASMA-ASSISTED ETCHING IN MICROFABRICATION
    COBURN, JW
    WINTERS, HF
    [J]. ANNUAL REVIEW OF MATERIALS SCIENCE, 1983, 13 : 91 - 116
  • [5] The Low Arc Volt
    Druyvesteyn, M. J.
    [J]. ZEITSCHRIFT FUR PHYSIK, 1930, 64 (11-12): : 781 - 798
  • [6] DECAPSULATION AND PHOTORESIST STRIPPING IN OXYGEN MICROWAVE PLASMAS
    DZIOBA, S
    ESTE, G
    NAGUIB, HM
    [J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (11) : 2537 - 2541
  • [7] Heidenreich J. E., 1986, Microelectronic Engineering, V5, P363, DOI 10.1016/0167-9317(86)90065-1
  • [8] ELECTROSTATIC-PROBE ANALYSIS OF MICROWAVE PLASMAS USED FOR POLYMER ETCHING
    HEIDENREICH, JE
    PARASZCZAK, JR
    MOISAN, M
    SAUVE, G
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1987, 5 (01): : 347 - 354
  • [9] ANALYSIS OF ELECTRON SWARM EXPERIMENTS IN OXYGEN
    MYERS, H
    [J]. JOURNAL OF PHYSICS PART B ATOMIC AND MOLECULAR PHYSICS, 1969, 2 (03): : 393 - &
  • [10] Pang S. W., 1986, Microelectronic Engineering, V5, P351, DOI 10.1016/0167-9317(86)90064-X