DEPOSITION OF FLUOROPOLYMER THIN-FILMS BY VACUUM-ULTRAVIOLET LASER-ABLATION

被引：63

作者：

UENO, Y ^{[1
]}

FUJII, T ^{[1
]}

KANNARI, F ^{[1
]}

机构：

[1] KEIO UNIV,FAC SCI & TECHNOL,DEPT ELECT ENGN,3-14-1 HIYOSHI,KOHOKU KU,YOKOHAMA,KANAGAWA 223,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1994年 / 65卷 / 11期

关键词：

D O I：

10.1063/1.112055

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Crystalline thin films of polytetrafluoroethylene were deposited on Si(100) wafers by F2 laser (157 nm) ablation in 200 mTorr Ar gas atmosphere. X-ray photoemission spectra indicated that the composition of the deposited films was similar to the source material. The surface morphology of films deposited at room temperature contained numerous fibrous structures in size of 100-400 nm, but they were smoothed out at elevated wafer temperature of approximately 370 K, while the crystalline feature was still maintained. The refractive index was approximately 1.35 at 633 nm.

引用

页码：1370 / 1372

页数：3