A PHENOMENOLOGICAL STUDY OF PARTICULATES IN PLASMA TOOLS AND PROCESSES

被引:141
作者
SELWYN, GS
机构
[1] IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, NY, 10598
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 6B期
关键词
PARTICLES; PARTICULATE CONTAMINATION; LIGHT SCATTERING; PLASMA TOOLS; ELECTROSTATIC PARTICLE TRAPS; CONTAMINATION CONTROL;
D O I
10.1143/JJAP.32.3068
中图分类号
O59 [应用物理学];
学科分类号
摘要
Particle contamination in a variety of plasma processes and tools has been studied using a real-time, in-situ detection technique, rastered laser light scattering. In agreement with previous studies, particles were suspended in the plasma. The distribution of particles, however, is highly ordered and predictable, in contrast to the randomness which typifies particulate behavior in uncharged environments, such as cleanrooms. The importance of electrostatic particle trapping is seen, as a means of understanding this ordered distribution of particles, for predictive performance of process tools in manufacturing, and for contamination control in processing tools. The implications of these results on future plasma processing is briefly discussed.
引用
收藏
页码:3068 / 3073
页数:6
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