MINIMIZATION OF FATIGUE IN FERROELECTRIC-FILMS

被引:45
作者
DESU, SB
机构
[1] Department of Materials Science and Engineering, Virginia Tech, Blacksburg
来源
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1995年 / 151卷 / 02期
关键词
D O I
10.1002/pssa.2211510224
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
On the basis of a quantitative fatigue model, various methods to minimize fatigue in oxide ferroelectric films are discussed. The model attributes fatigue to domain pinning by space charge that is caused by oxygen vacancy entrapment at the interfaces (e.g., electrode-ferroelectric, domain boundaries, etc.). Based on this model, it is demonstrated that fatigue can be minimized by a) using conductive oxide electrodes (e.g., RuO2) that prevent space charge formation at the interfaces, b) by addition of donor dopants (e.g., Nb, La in Pb(ZrxTi1-x)O-3) that reduce the oxygen vacancy concentration, and c) by utilizing ferroelectric materials (e.g., SrBi2(TaxNb1-x)(2)O-9) that have a low intrinsic defect concentration.
引用
收藏
页码:467 / 480
页数:14
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