SOME LIMITATIONS ON ELECTRON-BEAM LITHOGRAPHY

被引：5

作者：

CREWE, AV ^{[1
]}

机构：

[1] UNIV CHICAGO,CHICAGO,IL 60637

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1979年 / 16卷 / 02期

关键词：

D O I：

10.1116/1.569922

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Since there is a considerable interest in improving the performance of electron probe systems it is important to know what, if any, are the ultimate limitations. In this paper we examine some potentially limiting factors. Specifically we look at those due to the resist material itself, spherical aberration, the electron source, the deflection system and finally some concerns about the properties of small conductors. Our conclusion is that it should be possible to obtain currents of 500 nA in probes 200 A or so in radius.

引用

页码：255 / 259

页数：5