LOW-ENERGY ELECTRON-DIFFRACTION AND PHOTOEMISSION-STUDY OF EPITAXIAL-FILMS OF CU ON AG(001)

被引：40

作者：

LI, H ^{[1
]}

TIAN, D ^{[1
]}

QUINN, J ^{[1
]}

LI, YS ^{[1
]}

JONA, F ^{[1
]}

MARCUS, PM ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

PHYSICAL REVIEW B | 1991年 / 43卷 / 08期

关键词：

D O I：

10.1103/PhysRevB.43.6342

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The epitaxy of Cu on Ag{001} is studied by qualitative and quantitative low-energy electron diffraction (LEED) and by angle-resolved photoemission. LEED indicates that ultrathin (two- to three-atomic-layer) films have a limited amount of long-range order, and the ordered component has interlayer spacings of 1.45 +/- 0.06 angstrom, which compares well with the theoretically determined cubic lattice constant 2.87 +/- 0.06 angstrom of a metastable body-centered-cubic (bcc) modification of Cu. Thicker (10- to 12-layer) films have almost no long-range order, and photoemission indicates that regions of bcc and fcc Cu coexist amid large amounts of defects.

引用

页码：6342 / 6346

页数：5

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