SPECTROMETRY OF X-RAY-INDUCED EMISSION IN SPUTTERING DEPOSITION - A NEW TECHNIQUE FOR INSITU THIN-FILM CHEMICAL-ANALYSIS

被引：17

作者：

HECQ, M

LELEUX, J

机构：

[1] Univ de Mons, Mons, Belg, Univ de Mons, Mons, Belg

来源：

关键词：

D O I：

10.1021/ac00130a014

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

引用

页码：440 / 443

页数：4

共 14 条

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[10] STATHAM PJ, 1979, MICROBEAM ANAL 1979, P247