REACTIONS OF RECOILING SILICON ATOMS WITH PHOSPHINE-DIENE MIXTURES AND QUESTION OF SILYLENE INTERMEDIATES

被引：35

作者：

HWANG, RJ ^{[1
]}

GASPAR, PP ^{[1
]}

机构：

[1] WASHINGTON UNIV,DEPT CHEM,ST LOUIS,MO 63130

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1978年 / 100卷 / 21期

关键词：

D O I：

10.1021/ja00489a012

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

收藏

页码：6626 / 6635

页数：10

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