DYNAMICAL ELECTRON-SCATTERING FROM GROWING SURFACES

被引:4
作者
DUDAREV, SL [1 ]
VVEDENSKY, DD [1 ]
WHELAN, MJ [1 ]
机构
[1] UNIV LONDON IMPERIAL COLL SCI & TECHNOL,BLACKETT LAB,LONDON SW7 2BZ,ENGLAND
基金
英国工程与自然科学研究理事会;
关键词
ELECTRON-SOLID INTERACTIONS; EPITAXY; GALLIUM ARSENIDE; GROWTH; MODELS OF SURFACE KINETICS; MOLECULAR BEAM EPITAXY; REFLECTION HIGH-ENERGY ELECTRON DIFFRACTION; SEMIEMPIRICAL MODELS AND MODEL CALCULATIONS; SEMICONDUCTING SURFACES; SINGLE CRYSTAL EPITAXY;
D O I
10.1016/0039-6028(94)00811-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Statistical methods developed for the evaluation of the electrical conductivity in metals are applied to formulate a dynamical theory for the scattering of high-energy electrons from a rough growing surface. The high-energy forms of the Dyson and Bethe-Salpeter equations are used to identify the correlations that dominate the behaviour of the scattered intensities. Using an exactly solvable model of epitaxial growth, we find that for Bragg conditions of incidence the diffuse scattering by morphological fluctuations is largely responsible for the oscillations of the reflected intensities and for the non-linear enhancement of the ''Kikuchi'' features in the electron diffraction pattern.
引用
收藏
页码:L355 / L361
页数:7
相关论文
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