SOME ASPECTS OF SILICON RADICAL CHEMISTRY

[21] COCHRAN EL, 1959, 4 INT S FREE RAD STA

[22] REACTION OF ALPHA-TRIALKYLSILYL CARBENES [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1968, 11 (03) : 429 - &

[23] BOND DISSOCIATION ENERGIES IN ORGANOSILICON COMPOUNDS [J]. CHEMICAL COMMUNICATIONS, 1966, (06) : 178 - &

[24] REACTIONS OF SUBSTITUTED SILYL RADICALS WITH CHLOROALKANES [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1967, 10 (03) : 447 - &

[25] SILICON-SILICON BOND DISSOCIATION ENERGY IN HEXAMETHYLDISILANE [J]. JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1968, (02): : 282 - &

[26] APPEARANCE POTENTIALS OF TRIALKYLSILYL IONS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1967, 7 (02) : P24 - &

[27] FACTORS INFLUENCING FORMATION OF SILYLENES IN PYROLYSIS OF SILICON COMPOUNDS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1970, 24 (01) : 97 - &

[28] DAVIDSON IMT, 1969, CHEM COMMUN, P1276

[29] DAVIDSON IMT, UNPUBLISHED RESULTS

[30] DAVIDSON IMT, UNPUBLISHED WORK

[21] COCHRAN EL, 1959, 4 INT S FREE RAD STA

[22] REACTION OF ALPHA-TRIALKYLSILYL CARBENES [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1968, 11 (03) : 429 - &

[23] BOND DISSOCIATION ENERGIES IN ORGANOSILICON COMPOUNDS [J]. CHEMICAL COMMUNICATIONS, 1966, (06) : 178 - &

[24] REACTIONS OF SUBSTITUTED SILYL RADICALS WITH CHLOROALKANES [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1967, 10 (03) : 447 - &

[25] SILICON-SILICON BOND DISSOCIATION ENERGY IN HEXAMETHYLDISILANE [J]. JOURNAL OF THE CHEMICAL SOCIETY A -INORGANIC PHYSICAL THEORETICAL, 1968, (02): : 282 - &

[26] APPEARANCE POTENTIALS OF TRIALKYLSILYL IONS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1967, 7 (02) : P24 - &

[27] FACTORS INFLUENCING FORMATION OF SILYLENES IN PYROLYSIS OF SILICON COMPOUNDS [J]. JOURNAL OF ORGANOMETALLIC CHEMISTRY, 1970, 24 (01) : 97 - &

[28] DAVIDSON IMT, 1969, CHEM COMMUN, P1276

[29] DAVIDSON IMT, UNPUBLISHED RESULTS

[30] DAVIDSON IMT, UNPUBLISHED WORK