ANALYSIS OF THE OXIDATION OF POLYCRYSTALLINE ZINC SELENIDE BY SPECTROSCOPIC ELLIPSOMETRY AND PHOTOTHERMAL DEFLECTION SPECTROSCOPY

被引：15

作者：

MASETTI, E ^{[1
]}

MONTECCHI, M ^{[1
]}

DASILVA, MP ^{[1
]}

机构：

[1] UFRN,DEPT PHYS,BR-59072 NATAL,BRAZIL

来源：

THIN SOLID FILMS | 1993年 / 234卷 / 1-2期

关键词：

Chemical analysis - Crystalline materials - Ellipsometry - Film growth - Optical properties - Oxidation - Oxides - Radiation effects - Selenium compounds - Spectroscopy - Surface cleaning - Ultraviolet radiation;

D O I：

10.1016/0040-6090(93)90331-I

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The surface of polycrystalline zinc selenide was examined by spectroscopic ellipsometry (500-840 nm) and photothermal deflection spectroscopy (500-840 nm and 10.6 mum). Sample surfaces finished in different ways were considered. For each of them an overlayer was detected and its optical constants were characterized before and after UV exposure. The UV exposure caused a manifest growth of the overlayer and an increment in the absorption at 10.6 mum. Chemical analysis revealed the presence of selenium oxide in the overlayers. The ZnSe refractive index was determined in the 500-840 nm range. A cleaning procedure to obtain an almost contaminant-free surface was developed.

引用

页码：557 / 560

页数：4

共 9 条

[1]

ARWIN H, 1983, J APPL PHYS, V54, P7132, DOI 10.1063/1.331984

[2]

Azzam R.M.A., 1979, ELLIPSOMETRY POLARIZ

[3] DIRECT MEASUREMENT OF GAP-STATE ABSORPTION IN HYDROGENATED AMORPHOUS-SILICON BY PHOTOTHERMAL DEFLECTION SPECTROSCOPY [J].

JACKSON, WB ;

AMER, NM .

PHYSICAL REVIEW B, 1982, 25 (08) :5559-5562

[4]

JACKSON WB, 1981, APPL OPTICS, V20, P1933

[5] CHARACTERIZATION OF SOME SUITABLE DEFLECTING LIQUIDS IN PHOTOTHERMAL DEFLECTION SPECTROSCOPY [J].

MONTECCHI, M ;

MASETTI, E .

APPLIED OPTICS, 1990, 29 (28) :3989-3990

[6]

MONTECCHI M, 1991, PHYS REV B, V44, P649

[7] ELLIPSOMETRIC PARAMETERS OF ROUGH SURFACES AND OF A SYSTEM SUBSTRATE THIN FILM WITH ROUGH BOUNDARIES [J].

OHLIDAL, I ;

LUKES, F .

OPTICA ACTA, 1972, 19 (10) :817-&

[8]

SOTNIKOV VT, 1985, SOV J OPT TECHNOL+, V52, P664

[9]

WARD L, 1991, HDB OPTICAL CONSTANT, V2, P737

← 1 →