MULTIPLICATION OF MISFIT DISLOCATIONS IN EPITAXIAL LAYERS

被引:96
作者
BEANLAND, R
机构
[1] Department of Materials Science and Engineering, University of Liverpool, Liverpool L69 3BX
关键词
D O I
10.1063/1.352257
中图分类号
O59 [应用物理学];
学科分类号
摘要
The conditions for operation of two multiplication mechanisms in strained layers are analyzed. These are spiral and Fran k -Read type sources. It is shown that a minimum thickness is required for their operation, of the order of four times the critical thickness for the bending over of threading dislocations. The implications for strain relief of mismatched layers are discussed.
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页码:4031 / 4035
页数:5
相关论文
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