REFLECTION MASK DEFECT REPAIR

被引：5

作者：

HAWRYLUK, AM ^{[1
]}

STEWART, D ^{[1
]}

机构：

[1] MICRION CORP, PEABODY, MA 01960 USA

来源：

APPLIED OPTICS | 1993年 / 32卷 / 34期

关键词：

D O I：

10.1364/AO.32.007012

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We developed a new technique for the repair of opaque defects on soft-x-ray projection lithography reflection masks by using ion-beam etching and a thin Si overcoat on the multilayer mirror. This technique clears the defect without damaging the multilayer mirror or introducing an absorptive element into the multilayer. Our procedure uses a beam of low atomic number ions (Si or Ar) of reduced beam energy and a thin Si overcoat to protect the multilayer mirror.

引用

页码：7012 / 7015

页数：4