MICROSCOPIC STUDY OF TUNNELING PROCESSES VIA LOCALIZED STATES IN AMORPHOUS-SI/SIOX TUNNEL BARRIERS

被引：62

作者：

NAITO, M ^{[1
]}

BEASLEY, MR ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT APPL PHYS,STANFORD,CA 94305

来源：

PHYSICAL REVIEW B | 1987年 / 35卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.35.2548

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：2548 / 2551

页数：4

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