TEMPERATURE CHANGES IN THIN FILMS DURING GROWTH BY PHYSICAL VAPOR DEPOSITION .1. THEORETICAL

被引：11

作者：

THORNBURG, DD

WAYMAN, CM

机构：

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D O I：

10.1063/1.1659725

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4063 / +

页数：1

共 19 条

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ABRAHAM, FF
WHITE, GM
[J]. JOURNAL OF APPLIED PHYSICS, 1970, 41 (04) : 1841 - &
[2] TEMPERATURE CHANGES IN THIN METAL FILMS DURING VAPOR DEPOSITION
BELOUS, MV
WAYMAN, CM
[J]. JOURNAL OF APPLIED PHYSICS, 1967, 38 (13) : 5119 - &
[3] CARSLAW H, 1965, CONDUCTION HEAT SOLI, P112
[4] DRUMMETER LF, 1964, PHYS THIN FILMS, V2, P305
[5] THERMAL ASPECTS OF THE GROWTH OF THIN FILMS BY VACUUM SUBLIMATION
GAFNER, G
[J]. PHILOSOPHICAL MAGAZINE, 1960, 5 (58): : 1041 - 1048
[6] HIRTH JP, 1962, METAL SURFACES STRUC
[7] HODGMAN CD, 1961, HDB CHEMISTRY PHYSIC
[8] HONIG RE, 1962, RCA REV, V23, P567
[9] HOTTEL HC, 1954, HEAT TRANSMISSION, P72
[10] Karplus W.J., 1958, ANALOG SIMULATION