UNIFIED EXPLANATION FOR SECONDARY ION YIELDS

被引：91

作者：

DELINE, VR ^{[1
]}

EVANS, CA ^{[1
]}

WILLIAMS, P ^{[1
]}

机构：

[1] UNIV ILLINOIS,SCH CHEM SCI,URBANA,IL 61801

来源：

APPLIED PHYSICS LETTERS | 1978年 / 33卷 / 07期

关键词：

D O I：

10.1063/1.90466

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：578 / 580

页数：3

共 12 条

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ANDERSEN, CA ;

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[2] THERMODYNAMIC APPROACH TO QUANTITATIVE INTERPRETATION OF SPUTTERED ION MASS-SPECTRA [J].

ANDERSEN, CA ;

HINTHORNE, JR .

ANALYTICAL CHEMISTRY, 1973, 45 (08) :1421-1438

[3]

DELINE VR, UNPUBLISHED

[4]

HASTED JB, 1972, PHYSICS ATOMIC COLLI

[5]

Hotop H., 1975, Journal of Physical and Chemical Reference Data, V4, P539, DOI 10.1063/1.555524

[6] SECONDARY-ION MASS-SPECTROMETRY AND ITS USE IN DEPTH PROFILING [J].

LIEBL, H .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1975, 12 (01) :385-391

[7] EVALUATION OF LOCAL THERMAL-EQUILIBRIUM MODEL FOR QUANTITATIVE SECONDARY ION MASS-SPECTROMETRIC ANALYSIS [J].

SIMONS, DS ;

BAKER, JE ;

EVANS, CA .

ANALYTICAL CHEMISTRY, 1976, 48 (09) :1341-1348

[8]

STORMS HA, 1977, ANAL CHEM, V49, P2029

[9] MECHANISM OF SIMULTANEOUS IMPLANTATION AND SPUTTERING BY HIGH-ENERGY OXYGEN IONS DURING SECONDARY ION MASS-SPECTROMETRY (SIMS) ANALYSIS [J].

TSAI, JCC ;

MORABITO, JM .

SURFACE SCIENCE, 1974, 44 (01) :247-252

[10]

WILLIAMS PC, UNPUBLISHED

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