NUCLEATION OF CU ON SI(111)7X7 AND ATOMIC-STRUCTURE OF THE CU/SI(111) INTERFACE

被引：46

作者：

TOSCH, S

NEDDERMEYER, H

机构：

来源：

SURFACE SCIENCE | 1989年 / 211卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(89)90763-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：133 / 142

页数：10

共 10 条

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BRODDE, A ;

NEDDERMEYER, H ;

TOSCH, S .

SURFACE SCIENCE, 1988, 193 (1-2) :235-258

[2] 7X7 SI(111)-CU INTERFACES - COMBINED LEED, AES AND EELS MEASUREMENTS [J].

DAUGY, E ;

MATHIEZ, P ;

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LAYET, JM .

SURFACE SCIENCE, 1985, 154 (01) :267-283

[3] OBSERVATION OF ATOMIC CORRUGATION ON AU(111) BY SCANNING TUNNELING MICROSCOPY [J].

HALLMARK, VM ;

CHIANG, S ;

RABOLT, JF ;

SWALEN, JD ;

WILSON, RJ .

PHYSICAL REVIEW LETTERS, 1987, 59 (25) :2879-2882

[4] SURFACE ELECTRONIC-STRUCTURE OF SI(111)-(7 X 7) RESOLVED IN REAL SPACE [J].

HAMERS, RJ ;

TROMP, RM ;

DEMUTH, JE .

PHYSICAL REVIEW LETTERS, 1986, 56 (18) :1972-1975

[5] AES, LEED AND TDS STUDIES OF CU ON SI(111)7X7 AND SI(100)2X1 [J].

KEMMANN, H ;

MULLER, F ;

NEDDERMEYER, H .

SURFACE SCIENCE, 1987, 192 (01) :11-26

[6]

KOHLER U, COMMUNICATION

[7]

STTOSCH, 1988, INT C SCANNING TUNNE

[8]

STTOSCH, IN PRESS

[9] STRUCTURAL-ANALYSIS OF SI(111)-7X7 BY UHV-TRANSMISSION ELECTRON-DIFFRACTION AND MICROSCOPY [J].

TAKAYANAGI, K ;

TANISHIRO, Y ;

TAKAHASHI, M ;

TAKAHASHI, S .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1985, 3 (03) :1502-1506

[10]

WILSON RE, IN PRESS

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