EVALUATION OF A TANTALUM-TIP ELECTROTHERMAL VAPORIZATION SAMPLE INTRODUCTION DEVICE FOR MICROWAVE-INDUCED PLASMA MASS-SPECTROMETRY AND ATOMIC EMISSION-SPECTROMETRY

被引：21

作者：

EVANS, EH

CARUSO, JA

SATZGER, RD

机构：

[1] UNIV CINCINNATI,DEPT CHEM,CINCINNATI,OH 45221

[2] US FDA,NATL FORENS CHEM CTR,CINCINNATI,OH 45202

来源：

APPLIED SPECTROSCOPY | 1991年 / 45卷 / 09期

关键词：

ELECTROTHERMAL VAPORIZATION; MICROWAVE-INDUCED PLASMA; MASS SPECTROMETRY; ATOMIC EMISSION SPECTROMETRY;

D O I：

10.1366/0003702914335436

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An integrated electrothermal vaporization/microwave-induced plasma device has been shown to be a viable source for atomic emission and mass spectrometry. The tantalum-tipped electrothermal vaporizer ensured that no analyte condensation occurred during transport to the plasma and facilitated the formation of an annular helium plasma. Detection limits obtained with atomic emission spectrometry were 0.6, 21, and 2400 pg for Ag, Pb, and I, respectively, and those obtained with mass spectrometry were 0.03, 0.09, 0.75, and 1.5 pg for Ag, Cd, Pb, and Br, respectively. Detection limits were blank limited due to contaminants in the materials used in construction of the furnace. The current study was limited to high-volatility elements.

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页码：1478 / 1484

页数：7

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