RADIOFREQUENCY LOW-PRESSURE SUPERSONIC JET PLASMA CHEMICAL-SYSTEM

被引：11

作者：

SICHA, M ^{[1
]}

SOUKUP, L ^{[1
]}

JASTRABIK, L ^{[1
]}

NOVAK, M ^{[1
]}

TICHY, M ^{[1
]}

机构：

[1] ACAD SCI CZECH REPUBL,INST PHYS,DIV OPT,CR-18040 PRAGUE 8,CZECH REPUBLIC

来源：

SURFACE & COATINGS TECHNOLOGY | 1995年 / 74-5卷 / 1-3期

关键词：

PLASMA CHEMICAL REACTOR; PLASMA JET; HOLLOW CATHODE DISCHARGE; THIN FILM DEPOSITION;

D O I：

10.1016/0257-8972(95)08357-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This paper presents a refined model for the generation of a supersonic plasma jet by a hollow cathode discharge inside the nozzle of a low pressure r.f. plasma chemical reactor. Through the nozzle which is placed in the r.f. electrode the working gas flows to the reactor chamber. If at the outlet of the nozzle the gas flow is supersonic, a well-defined plasma jet is created inside the reactor chamber. The application of this system for the deposition of germanium nitride thin films is shown.

引用

页码：212 / 214

页数：3