POINT EXPOSURE DISTRIBUTION MEASUREMENTS FOR PROXIMITY CORRECTION IN ELECTRON-BEAM LITHOGRAPHY ON A SUB-100 NM SCALE

被引：173

作者：

RISHTON, SA

KERN, DP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 01期

关键词：

D O I：

10.1116/1.583847

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：135 / 141

页数：7

共 12 条

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