PROXIMITY EFFECT CORRECTION FOR ELECTRON-BEAM LITHOGRAPHY BY EQUALIZATION OF BACKGROUND DOSE

被引：145

作者：

OWEN, G

RISSMAN, P

机构：

来源：

关键词：

D O I：

10.1063/1.332426

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3573 / 3581

页数：9

共 8 条

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[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) : 686 - 693
[5] OWEN G, 1888, Patent No. 389306
[6] CORRECTIONS TO PROXIMITY EFFECTS IN ELECTRON-BEAM LITHOGRAPHY .1. THEORY
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[J]. JOURNAL OF APPLIED PHYSICS, 1979, 50 (06) : 4371 - 4377
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